Shi, S.; Yu, Y.; Wang, N.; Zhang, Y.; Shi, W.; Liao, X.; Duan, N.
Investigation of the Anisotropy of 4H-SiC Materials in Nanoindentation and Scratch Experiments. Materials 2022, 15, 2496.
https://doi.org/10.3390/ma15072496
AMA Style
Shi S, Yu Y, Wang N, Zhang Y, Shi W, Liao X, Duan N.
Investigation of the Anisotropy of 4H-SiC Materials in Nanoindentation and Scratch Experiments. Materials. 2022; 15(7):2496.
https://doi.org/10.3390/ma15072496
Chicago/Turabian Style
Shi, Suhua, Yiqing Yu, Ningchang Wang, Yong Zhang, Weibin Shi, Xinjiang Liao, and Nian Duan.
2022. "Investigation of the Anisotropy of 4H-SiC Materials in Nanoindentation and Scratch Experiments" Materials 15, no. 7: 2496.
https://doi.org/10.3390/ma15072496
APA Style
Shi, S., Yu, Y., Wang, N., Zhang, Y., Shi, W., Liao, X., & Duan, N.
(2022). Investigation of the Anisotropy of 4H-SiC Materials in Nanoindentation and Scratch Experiments. Materials, 15(7), 2496.
https://doi.org/10.3390/ma15072496