Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors
Abstract
:1. Introduction
2. Device Fabrication
3. Characterization and Discussions
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Im, K.-S.; Shin, S.; Jang, C.-H.; Cha, H.-Y. Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors. Materials 2022, 15, 7475. https://doi.org/10.3390/ma15217475
Im K-S, Shin S, Jang C-H, Cha H-Y. Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors. Materials. 2022; 15(21):7475. https://doi.org/10.3390/ma15217475
Chicago/Turabian StyleIm, Ki-Sik, Seungheon Shin, Chan-Hee Jang, and Ho-Young Cha. 2022. "Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors" Materials 15, no. 21: 7475. https://doi.org/10.3390/ma15217475