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Journal: Materials, 2022
Volume: 15
Number: 123

Article: A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
Authors: by Katarzyna Racka-Szmidt, Bartłomiej Stonio, Jarosław Żelazko, Maciej Filipiak and Mariusz Sochacki
Link: https://www.mdpi.com/1996-1944/15/1/123

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