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Journal: MaterialsVolume: 14Number: 690
Article: Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
  • Authors:
  • Pao-Hsun Huang1,
  • Zhi-Xuan Zhang2 and
  • Chia-Hsun Hsu2
  • et al.
Link: https://www.mdpi.com/1996-1944/14/3/690

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