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Journal: Materials, 2021
Volume: 14
Number: 690
690
Article: Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO₂ Thin Films via Atomic Layer Deposition
Authors: by Pao-Hsun Huang, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Chien-Jung Huang and Shui-Yang Lien
Link: https://www.mdpi.com/1996-1944/14/3/690

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