Kim, K.-M.; Jang, J.S.; Yoon, S.-G.; Yun, J.-Y.; Chung, N.-K.
Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. Materials 2020, 13, 2008.
https://doi.org/10.3390/ma13092008
AMA Style
Kim K-M, Jang JS, Yoon S-G, Yun J-Y, Chung N-K.
Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. Materials. 2020; 13(9):2008.
https://doi.org/10.3390/ma13092008
Chicago/Turabian Style
Kim, Kyoung-Mun, Jin Sub Jang, Soon-Gil Yoon, Ju-Young Yun, and Nak-Kwan Chung.
2020. "Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition" Materials 13, no. 9: 2008.
https://doi.org/10.3390/ma13092008
APA Style
Kim, K.-M., Jang, J. S., Yoon, S.-G., Yun, J.-Y., & Chung, N.-K.
(2020). Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. Materials, 13(9), 2008.
https://doi.org/10.3390/ma13092008