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Open AccessFeature PaperArticle

Plasma Fabrication and SERS Functionality of Gold Crowned Silicon Submicrometer Pillars

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Departamento de Física Aplicada and Instituto de Ciencia de Materiales Nicolás Cabrera, Universidad Autónoma de Madrid, 28049 Madrid, Spain
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Plasmore S.r.l., Via Vittorio Emanuele II 4, 27100 Pavia, Italy
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Istituti Clinici Scientifici Maugeri IRCCS, via Maugeri 4, 27100 Pavia, Italy
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IRCCS Fondazione Don Carlo Gnocchi, Via Capecelatro 66, 20148 Milano, Italy
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Departamento de Ciencia, Computación y Tecnología, Universidad Europea de Madrid, 28670 Villaviciosa de Odón, Madrid, Spain
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Physics Department, University of Pavia. via A.Bassi, 6. I-27100, Pavia, Italy
*
Author to whom correspondence should be addressed.
Materials 2020, 13(5), 1244; https://doi.org/10.3390/ma13051244
Received: 10 February 2020 / Revised: 3 March 2020 / Accepted: 5 March 2020 / Published: 10 March 2020
(This article belongs to the Special Issue Plasma Surface Engineering of Materials)
Sequential plasma processes combined with specific lithographic methods allow for the fabrication of advanced material structures. In the present work, we used self-assembled colloidal monolayers as lithographic structures for the conformation of ordered Si submicrometer pillars by reactive ion etching. We explored different discharge conditions to optimize the Si pillar geometry. Selected structures were further decorated with gold by conventional sputtering, prior to colloidal monolayer lift-off. The resulting structures consist of a gold crown, that is, a cylindrical coating on the edge of the Si pillar and a cavity on top. We analysed the Au structures in terms of electronic properties by using X-ray absorption spectroscopy (XAS) prior to and after post-processing with thermal annealing at 300 °C and/or interaction with a gold etchant solution (KI). The angular dependent analysis of the plasmonic properties was studied with Fourier transformed UV-vis measurements. Certain conditions were selected to perform a surface enhanced Raman spectroscopy (SERS) evaluation of these platforms with two model dyes, prior to confirming the potential interest for a well-resolved analysis of filtered blood plasma. View Full-Text
Keywords: SERS; Si pillars; reactive ion etching; gold nanostructures; sputtering; XAS SERS; Si pillars; reactive ion etching; gold nanostructures; sputtering; XAS
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MDPI and ACS Style

Pellacani, P.; Morasso, C.; Picciolini, S.; Gallach, D.; Fornasari, L.; Marabelli, F.; Manso Silvan, M. Plasma Fabrication and SERS Functionality of Gold Crowned Silicon Submicrometer Pillars. Materials 2020, 13, 1244.

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