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Journal: Materials, 2020
Volume: 13
Number: 5476

Article: Plasma Parameters and Etching Characteristics of SiOxNy Films in CF4 + O2 + X (X = C4F8 or CF2Br2) Gas Mixtures
Authors: by Yunho Nam, Alexander Efremov, Byung Jun Lee and Kwang-Ho Kwon
Link: https://www.mdpi.com/1996-1944/13/23/5476

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