Article Versions Notes

Xu Y, Zhang C, Cheng Y, Li Z, Cheng Y, Feng Q, Chen D, Zhang J, Hao Y. Influence of Carrier Gases on the Quality of Epitaxial Corundum-Structured α-Ga₂O₃ Films Grown by Mist Chemical Vapor Deposition Method. Materials. 2019; 12(22):3670. https://doi.org/10.3390/ma12223670

Xu, Yu, Chunfu Zhang, Yaolin Cheng, Zhe Li, Ya’nan Cheng, Qian Feng, Dazheng Chen, Jincheng Zhang, and Yue Hao. 2019. "Influence of Carrier Gases on the Quality of Epitaxial Corundum-Structured α-Ga₂O₃ Films Grown by Mist Chemical Vapor Deposition Method" Materials 12, no. 22: 3670. https://doi.org/10.3390/ma12223670

Xu, Y., Zhang, C., Cheng, Y., Li, Z., Cheng, Y., Feng, Q., Chen, D., Zhang, J., & Hao, Y. (2019). Influence of Carrier Gases on the Quality of Epitaxial Corundum-Structured α-Ga₂O₃ Films Grown by Mist Chemical Vapor Deposition Method. Materials, 12(22), 3670. https://doi.org/10.3390/ma12223670