Zhang, C.; Gunes, O.; Li, Y.; Cui, X.; Mohammadtaheri, M.; Wen, S.-J.; Wong, R.; Yang, Q.; Kasap, S.
The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160.
https://doi.org/10.3390/ma12132160
AMA Style
Zhang C, Gunes O, Li Y, Cui X, Mohammadtaheri M, Wen S-J, Wong R, Yang Q, Kasap S.
The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials. 2019; 12(13):2160.
https://doi.org/10.3390/ma12132160
Chicago/Turabian Style
Zhang, Chunzi, Ozan Gunes, Yuanshi Li, Xiaoyu Cui, Masoud Mohammadtaheri, Shi-Jie Wen, Rick Wong, Qiaoqin Yang, and Safa Kasap.
2019. "The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior" Materials 12, no. 13: 2160.
https://doi.org/10.3390/ma12132160
APA Style
Zhang, C., Gunes, O., Li, Y., Cui, X., Mohammadtaheri, M., Wen, S.-J., Wong, R., Yang, Q., & Kasap, S.
(2019). The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials, 12(13), 2160.
https://doi.org/10.3390/ma12132160