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Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

by Shuai Hu 1, Zhenyu Chen 1,* and Xingpeng Guo 1,2,*
1
Hubei Key Laboratory of Materials Chemistry and Service Failure, School of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
2
School of Chemistry and Chemical Engineering, Guangzhou University, Guangzhou 510006, China
*
Authors to whom correspondence should be addressed.
Materials 2018, 11(7), 1225; https://doi.org/10.3390/ma11071225
Received: 12 June 2018 / Revised: 4 July 2018 / Accepted: 4 July 2018 / Published: 17 July 2018
A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAM on copper surface and on copper surface that is treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAM on bare copper surface exhibits good protection capacity, whereas a copper surface that is pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAM. View Full-Text
Keywords: copper; phosphoric acid; 3D nanostructures; 1-dodecanethiol SAM copper; phosphoric acid; 3D nanostructures; 1-dodecanethiol SAM
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Hu, S.; Chen, Z.; Guo, X. Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution. Materials 2018, 11, 1225.

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