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Materials 2018, 11(5), 846; https://doi.org/10.3390/ma11050846

Void Formation/Elimination and Viscoelastic Response of Polyphenylsilsesquioxane Monolith

Department of Life Science and Applied Chemistry, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, Aichi 466-8555, Japan
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Received: 18 April 2018 / Revised: 14 May 2018 / Accepted: 15 May 2018 / Published: 19 May 2018
(This article belongs to the Section Structure Analysis and Characterization)
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Abstract

Polyphenylsilsesquioxane (PhSiO3/2) particles as an organic-inorganic hybrid were prepared using sol-gel method, and monolithic samples were obtained via a warm-pressing. The reaction mechanism of particles’ polymerization and transformation to the monolith under the warm-press were investigated using solid state 29Si nuclear magnetic resonance (NMR) spectrometer, thermal gravimetric-differential thermal analyzer (TG-DTA), mass spectrometer (MS) and scanning electron microscope (SEM). Transparent and void-free monoliths are successfully obtained by warm-pressing above 180 °C. Both the terminal –OH groups on particles’ surface and warm-pressing are necessary for preparation of void-free PhSiO3/2 monolith. From the load-displacement measurement at various temperatures, a viscoelastic deformation is seen for PhSiO3/2 monolith with voids. On the other hand, an elastic deformation is seen for void-free PhSiO3/2 monolith, and the void-free monolith shows much higher breakdown voltage. View Full-Text
Keywords: silsesquioxane; power module; void; viscoelasticity; breakdown voltage silsesquioxane; power module; void; viscoelasticity; breakdown voltage
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Daiko, Y.; Oda, Y.; Honda, S.; Iwamoto, Y. Void Formation/Elimination and Viscoelastic Response of Polyphenylsilsesquioxane Monolith. Materials 2018, 11, 846.

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