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Journal: Materials, 2017
Volume: 10
Number: 102

Article: Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature
Authors: by Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal and Saadah Abdul Rahman
Link: https://www.mdpi.com/1996-1944/10/2/102

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