2.1. Fabrication Process
The quadrant silicon sensor developed in this study was fabricated based on a 6-inch n-type ⟨100⟩ silicon wafer with high resistivity (>5 kΩ·cm) and a thickness of 550 μm (Topsil, Batch No. PP8T121-1, Frederikssund, Denmark). The vertical structure of the sensor follows a p+/n/n+ configuration. The fabrication process involved approximately 50 single-sided processing steps, including four photolithography stages used to form the main patterns.
The active area was formed by implanting p
+ boron ions (
11B) into the high-resistivity n-type bulk substrate. During this process, a thin SiO
2 screening oxide layer was applied to prevent surface damage caused by ion implantation. The final depth of the p
+ implanted layer, formed through a high-temperature annealing process, is less than 1 μm. This layer plays a crucial role in forming a uniform electric field across the entire area of the sensor and ensuring stable junction characteristics [
14].
The backside of the wafer was converted into an n+ layer by implanting phosphorus dopants (31P) followed by annealing, thereby establishing an ohmic contact with the rear aluminum (Al) electrode. Subsequently, an SiO2 insulation layer was formed on the upper surface of the wafer, and contact holes were opened in the active area. A TiW barrier metal was then deposited to prevent junction spiking caused by aluminum diffusion into the silicon.
Finally, aluminum (Al) with a thickness of about 0.5 μm was deposited on both the front and back sides of the wafer. Since this sensor is designed for particle detection, optical transmission is not required. Therefore, a window structure was applied, where the entire active area is covered with Al metal to prevent charge accumulation on the oxide surface and to block light-induced noise.
2.2. Quadrant Sensor Design and Guard-Ring Layout
In terms of design, the quadrant sensor features a total active area of 5 × 5 cm2 divided into four segments, each with a size of 2.5 × 2.5 cm2. In a sensor structure where the area of individual segments is relatively large, the control of the electric field at the sensor edge determines the overall electrical stability. Therefore, a precise design of the termination structure at the outer regions plays a key role in ensuring high breakdown voltage characteristics and the reliability of the device.
The design strategy was adopted to gradually optimize the number and arrangement of guard-rings aimed to ensure electrical stability at the sensor edge. Through this process, 6-ring (G6), 9-ring (G9), and 14-ring (G14) structures were sequentially developed. These structures differ not only in the number of guard-rings but also in the total width of the termination region. This design evolution resulted from efforts to maximize electric field stability, providing essential baseline data for the subsequent simulation analysis and experimental results.
The schematic configuration and assembly of the developed sensor are detailed in
Figure 1. A conceptual cross-section of the sensor edge is illustrated in
Figure 1a, while
Figure 1b displays the fully assembled quadrant sensor mounted on a dedicated printed circuit board (PCB). This photograph clearly shows the total active area, consisting of four segments, as viewed from above.
Figure 2 presents a comparison of the top views for the three guard-ring designs (G6, G9, and G14). In all three structures, the specifications of the first guard-ring (1st) adjacent to the active area (A) were kept identical. However, the number and arrangement strategy for the remaining guard-ring regions were differentiated.
While the G6 structure is an initial model designed within a relatively limited termination width, the G9 and G14 structures feature expanded termination regions in the horizontal direction and readjusted ring spacing to maximize the efficiency of electric field relaxation at the outer regions. Specifically, the G6 structure features six guard-rings arranged within the termination region. The length scale of this termination region is similar to the sensor thickness (∼550 μm). This design was based on the initial hypothesis that a wider termination region would help relax the electric field toward the sensor edge. Subsequently, the G9 and G14 structures featured guard-rings arranged within expanded termination regions compared to the G6 structure.
The G9 structure consists of nine guard-rings arranged in two regions with different spacing characteristics. Near the active region, the inter-ring spacing was made dense to divide the potential drop more finely and reduce local electric field concentration. Toward the outer edge, the spacing was gradually increased as the potential gradient decreased, allowing the electric field to relax over a wider region. For optimization, the G9 ring width was made narrower than that of G6.
In contrast, the G14 structure maintains the same ring width as G9 but features guard-rings arranged with uniform inter-ring spacing throughout the entire termination region. This design was intended to relax the electric field uniformly and step-by-step across the whole termination area, rather than focusing on a specific region. The impact of this structural evolution on the actual electric field relaxation characteristics is evaluated in detail through the subsequent TCAD simulation analysis.
The main features and operational parameters of the quadrant sensor, including the three guard-ring configurations, are summarized in
Table 1 to provide a comprehensive overview of the detector.
2.3. TCAD Simulation of Guard-Ring Termination Structures
TCAD simulations were performed to compare and analyze the electric field distribution characteristics according to different guard-ring termination structures [
11].
Table 2 shows the key parameters and physical models used in the TCAD simulation. The simulation model incorporated ion implantation, oxidation, and other process conditions consistent with the actual fabrication process. A reverse bias was applied to the front active electrode, while the back side of the sensor was maintained at ground. All guard-rings were set to floating, with no bias applied.
Figure 3 shows the vertical 2D electric field distribution in the sensor termination region. In this figure, the x-axis represents the electric field distribution along the lateral direction of the sensor, while the y-axis represents the distribution along the sensor depth. All three structures exhibit similar electric field distributions near the active area; however, as they approach the outer part of the termination region, the electric field relaxation patterns become distinctly different according to the design strategy of each structure.
For a quantitative comparison of the electric-field characteristics of each structure,
Figure 4 presents 1D profiles of the electric field magnitude extracted along the lateral direction at a specific junction depth from
Figure 3. In this plot, the x-axis represents the lateral distance from the first guard-ring to the end of the termination region in arbitrary units (arb.). The y-axis is normalized to the maximum peak value, allowing for a direct comparison of the electric field-relaxation behavior among the three designs.
As shown in
Figure 4, all three designs exhibit similar maximum electric field intensities near the first guard-ring. This result reflects the first guard-ring design, which was applied identically to all structures. However, in the subsequent regions (toward the outer termination), the electric field relaxation characteristics differ distinctly depending on the guard-ring density and inter-ring spacing settings of each design.
In the G6 structure, the electric field remained at a higher level throughout the entire termination region compared to other designs, and a phenomenon in which the electric field increased again at the outermost guard-ring was specifically observed. This suggests that the termination structure ended before the electric field could be sufficiently relaxed within the termination region, causing an electric field crowding effect where the residual electric field locally concentrated at the outermost edge. These results confirm that the initial design hypothesis—setting the termination width based on wafer thickness—has limitations in achieving stable electric field relaxation. Consequently, the findings imply that securing a wider area along with a precise guard-ring arrangement strategy is essential to implement an effective termination structure.
The G14 structure forms a step-like distribution in which the electric field decreases stepwise. As shown in
Figure 4, G14 maintains a relatively lower electric field intensity throughout the termination region compared to G6. However, despite the expanded termination area and the larger number of guard-rings, the electric field reduction toward the outer direction remains insufficient. Consequently, an electric field crowding effect was observed near the outermost edge, similar to the G6 structure, where the electric field rises again. This shows that design optimization reflecting the electric-field distribution is necessary, rather than simply increasing the number of guard-rings.
In contrast, the G9 structure exhibits optimized electric field distribution characteristics that maximize efficiency through the previously described two-region design strategy, despite utilizing a smaller number of guard-rings within a termination area similar to G14. Examining the specific electric field distribution, a relatively high electric field intensity was observed in the near-active region, where guard-rings are densely arranged. This demonstrates that the electric field in the region experiencing rapid potential changes is finely partitioned, distributing the potential drop more gradually, as intended by the design. Subsequently, in the outer termination region, the electric field decreased significantly as the guard-ring spacing gradually increased, decreasing to nearly zero near the outer edge. Consequently, the electric field crowding effect at the outermost termination, which was observed in the G6 and G14 structures, is successfully suppressed in G9.
These results confirm that simply expanding the termination region or installing a large number of guard-rings is insufficient to ensure electrical stability, as seen in the comparison between G6 and G14. Rather, as demonstrated in the G9 structure, the electric field stability depends decisively on the strategic inter-ring spacing of the guard-rings within the termination region. Based on these results, all three structures (G6, G9, and G14) were fabricated and evaluated to experimentally verify the comparative analysis of their termination characteristics.
However, these TCAD simulation results are based on a 2D slice model (z-axis thickness: 1 μm) of the sensor edge, and thus have inherent limitations in fully capturing 3D geometric complexities such as corner curvature (
Figure 2) and the integrated electric field stress across a large-area device (5 × 5 cm
2). Consequently, the electric field distribution analysis from these simulations was utilized as a qualitative indicator to verify electric field relaxation effects and guard-ring design effectiveness, rather than to provide an exact quantitative prediction of the breakdown voltage.
2.4. Electrical Characterization
The electrical stability and operating parameters of the fabricated quadrant sensor were evaluated through both Current–Voltage (IV) and Capacitance–Voltage (CV) characterizations. The IV curves were measured using a Keithley 6487 Picoammeter/Voltage Source (Tektronix, Beaverton, OR, USA), while the CV characteristics were obtained with an HP Agilent 4277A Precision LCR Meter (Hewlett-Packard, Palo Alto, CA, USA) at a frequency of 1 MHz.
During the measurements, the same reverse bias was applied to all four electrodes, and the total leakage current and capacitance of the device were recorded. In particular, for the leakage current measurements, all guard-rings were left floating without any applied potential. This allowed for the observation of how the electric field relaxation effect, achieved through the self-potential distribution of the guard-rings, influences the leakage current and breakdown voltage characteristics.
Figure 5 shows the representative capacitance–voltage (CV) characteristics of a sensor fabricated using a substrate with a thickness of about 550 μm and a bulk resistivity of >5 kΩ·cm. The measured full depletion voltage (
) is about 140–150 V, which is in good agreement with the theoretical value calculated based on the physical specifications of the substrate [
9]. In this study, to verify the electrical stability of the sensor, including the operating margin after full depletion, the leakage current (IV) measurement range was extended up to
V, which is higher than
, to evaluate the characteristics of each guard-ring design.
The IV characteristics for sensors with the G6, G9, and G14 designs are compared in
Figure 6. In the case of the G6 design, a premature breakdown phenomenon was observed, characterized by a rapid increase in leakage current starting near
V and reaching several tens of μA at
V. This phenomenon suggests that the G6 structure was unable to effectively mitigate the electric field concentration in the termination region well before reaching the full depletion voltage of about
V.
In contrast, the sensors employing the G9 and G14 structures exhibited stable electrical characteristics up to the maximum applied voltage of V without breakdown. For both structures, the leakage current remained at the level of several tens of nA over the entire measurement range, with no significant increase observed even after full depletion.
These experimental results are qualitatively consistent with the electric field distribution trends predicted by TCAD simulations. In the simulations, the G6 structure exhibited high electric fields across the entire guard-ring region; in particular, the electric field peak near the outermost guard-ring was locally concentrated without sufficient mitigation. This aligns well with the rapid increase in current observed after V in the measurements.
Similar to the G6, the G14 structure also showed an electric field crowding effect at the last ring in simulations, yet it maintained stable characteristics up to a reverse bias of 200 V. This stability is attributed to the effective distribution of the electric field compared to the G6, resulting from the increased number of guard-rings. Meanwhile, the simulations revealed that the G9 structure suppressed the outermost electric field peak more effectively than the G14 structure. However, this performance difference did not directly translate into a significant difference in leakage current within the actual IV measurement range up to V.
This is because leakage current is likely a complex metric influenced not only by the maximum electric field at the termination but also by bulk generation current, surface states, and the measurement environment. Fundamentally, however, it is interpreted that both structures secured sufficient electric field margins to prevent breakdown within the V range. While the performance difference among the structures may become apparent in a higher voltage environment exceeding V, as shown in the simulation results, both designs demonstrated excellent stability within the operating range of this study.
In conclusion, the IV measurements performed in this study are primarily aimed at preventing premature breakdown and verifying high-voltage operational reliability, rather than quantitatively distinguishing the subtle current differences between guard-ring structures. From this perspective, both the G9 and G14 structures were confirmed to provide sufficient voltage margin and high-voltage stability within the operating range of this study. In particular, the G9 structure simultaneously satisfies the excellent field relaxation characteristics proven in TCAD simulations and the structural efficiency achieved through the optimization of the number of guard-rings. Accordingly, the G9 structure was adopted as the final design in this study, and subsequent performance evaluations were conducted using the sensor manufactured based on it.