Amato, U.; Antoniadis, A.; De Feis, I.; Doinychko, A.; Gijbels, I.; La Magna, A.; Pagano, D.; Piccinini, F.; Selvan Suviseshamuthu, E.; Severgnini, C.;
et al. Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production. Sensors 2025, 25, 4218.
https://doi.org/10.3390/s25134218
AMA Style
Amato U, Antoniadis A, De Feis I, Doinychko A, Gijbels I, La Magna A, Pagano D, Piccinini F, Selvan Suviseshamuthu E, Severgnini C,
et al. Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production. Sensors. 2025; 25(13):4218.
https://doi.org/10.3390/s25134218
Chicago/Turabian Style
Amato, Umberto, Anestis Antoniadis, Italia De Feis, Anastasiia Doinychko, Irène Gijbels, Antonino La Magna, Daniele Pagano, Francesco Piccinini, Easter Selvan Suviseshamuthu, Carlo Severgnini,
and et al. 2025. "Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production" Sensors 25, no. 13: 4218.
https://doi.org/10.3390/s25134218
APA Style
Amato, U., Antoniadis, A., De Feis, I., Doinychko, A., Gijbels, I., La Magna, A., Pagano, D., Piccinini, F., Selvan Suviseshamuthu, E., Severgnini, C., Torres, A., & Vasquez, P.
(2025). Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production. Sensors, 25(13), 4218.
https://doi.org/10.3390/s25134218
