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Journal: Sensors, 2024
Volume: 24
Number: 3089

Article: Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3–O2 Reactive Ion Etching: The Effect of NO Surface Reaction
Authors: by Nguyen Hoang Tung, Heesoo Lee, Duy Khoe Dinh, Dae-Woong Kim, Jin Young Lee, Geon Woong Eom, Hyeong-U Kim and Woo Seok Kang
Link: https://www.mdpi.com/1424-8220/24/10/3089

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