C-Axis Textured, 2–3 μm Thick Al0.75Sc0.25N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications
Abstract
:1. Introduction
2. Materials and Methods
2.1. Deposition of Titanium Films
2.2. Deposition of Al0.75Sc0.25N Thin Films
2.3. Measurement of the Piezoelectric Coefficient and Pyroelectric Response
2.4. Film Characterization—SEM, AFM, EDS, XRD, XPS
3. Results
3.1. Formation of TiN on a Ti Seeding Layer
3.2. Reactive Sputtering of AlScN
3.3. Pyroelectric Measurements
3.4. Measurement of the Piezoelectric Coefficient
4. Summary
5. Patents
Supplementary Materials
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Sample | Substrate | Under-Layer | AlScN hf [μm] | Film Stress σ [MPa] |
---|---|---|---|---|
ASN1 | Silicon (100) | 50 nm Ti | 3 ± 0.1 | 60 ± 10 |
ASN2 | Borosilicate glass (D263) | 50 nm Ti | 3 ± 0.1 | 80 ± 12 |
ASN3 | Silicon (100) | 100 nm Al + 50 nm Ti | 2 ± 0.1 | 56 ± 9 |
Cantilever # | |
---|---|
1 | 2.01 ± 0.15 |
2 | 1.85 ± 0.11 |
3 | 1.56 ± 0.10 |
4 | 1.82 ± 0.12 |
5 | 2.00 ± 0.20 |
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Cohen, A.; Cohen, H.; Cohen, S.R.; Khodorov, S.; Feldman, Y.; Kossoy, A.; Kaplan-Ashiri, I.; Frenkel, A.; Wachtel, E.; Lubomirsky, I.; et al. C-Axis Textured, 2–3 μm Thick Al0.75Sc0.25N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications. Sensors 2022, 22, 7041. https://doi.org/10.3390/s22187041
Cohen A, Cohen H, Cohen SR, Khodorov S, Feldman Y, Kossoy A, Kaplan-Ashiri I, Frenkel A, Wachtel E, Lubomirsky I, et al. C-Axis Textured, 2–3 μm Thick Al0.75Sc0.25N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications. Sensors. 2022; 22(18):7041. https://doi.org/10.3390/s22187041
Chicago/Turabian StyleCohen, Asaf, Hagai Cohen, Sidney R. Cohen, Sergey Khodorov, Yishay Feldman, Anna Kossoy, Ifat Kaplan-Ashiri, Anatoly Frenkel, Ellen Wachtel, Igor Lubomirsky, and et al. 2022. "C-Axis Textured, 2–3 μm Thick Al0.75Sc0.25N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications" Sensors 22, no. 18: 7041. https://doi.org/10.3390/s22187041
APA StyleCohen, A., Cohen, H., Cohen, S. R., Khodorov, S., Feldman, Y., Kossoy, A., Kaplan-Ashiri, I., Frenkel, A., Wachtel, E., Lubomirsky, I., & Ehre, D. (2022). C-Axis Textured, 2–3 μm Thick Al0.75Sc0.25N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications. Sensors, 22(18), 7041. https://doi.org/10.3390/s22187041