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Journal: Int. J. Mol. Sci., 2022
Volume: 23
Number: 16204
16204
Article: Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture
Authors: by Shicong Jiang, Wan-Yu Wu, Fangbin Ren, Chia-Hsun Hsu, Xiaoying Zhang, Peng Gao, Dong-Sing Wuu, Chien-Jung Huang, Shui-Yang Lien and Wenzhang Zhu
Link: https://www.mdpi.com/1422-0067/23/24/16204

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