Selective Binding, Self-Assembly and Nanopatterning of the Creutz-Taube Ion on Surfaces
Abstract
:1. Introduction
2. Experimental Section
2.1. Chemicals and Materials
2.2. Substrate Preparation
2.3. Surface Attachment of the Creutz-Taube ions on substrates
2.4. Electron Beam Lithography Patterning of the Creutz-Taube Ions
2.5. XPS measurement
2.6. Ellipsometric Measurement
2.7. Contact Angle Measurement
2.8. AFM Measurement
3. Results and Discussion
3.1. XPS Measurements on Bare Substrates and Bulk Powder Samples as Control Experiments
3.2. Selective Binding Properties on Surfaces
3.3. Inorganic SAMs: Characterization of the Creutz-Taube Ion on SiO2
3.4. Nanolines of the Creutz-Taube Ions Patterned through High-Resolution PMMA Masks
4. Conclusions
Acknowledgments
References and Notes
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Ru 3p | N 1s | S 2p | |
---|---|---|---|
Binding Energy (eV) | 461.8 (3p3/2)
484.7(3p1/2) | 399.7 | 167.9 |
Rel. Conc. (%) | 10.2 | 62.3 | 27.5 |
Ru | N | S | P | F | ||
---|---|---|---|---|---|---|
CT5(TOS)5 on SiO2 | B. E. (eV) | 462.4 (3p3/2)
485.7 (3p1/2) | 400.0 (1s) | No binding | -- | -- |
Rel. Conc. (/Ru) | 1 | 5.78 | ||||
CT5(TOS)5 on OTS/SiO2 | B. E. (eV) | No binding | No binding | No Binding | -- | -- |
Rel. Conc. (/Ru) | ||||||
CT5(TOS)5 on PMMA/SiO2 | B. E. (eV) | No binding | No binding | No Binding | -- | -- |
Rel. Conc. (/Ru) | ||||||
CT5(TOS)5 on HUT/Au | B. E. (eV) | 462.4 (3p3/2)
484.9 (3p1/2) | 399.8 (1s) | 168.1 (2p TOS)
162.0 (2p Thiol) | -- | -- |
Rel. Conc. (/Ru) | 1 | 5.41 | 1.70 (2p TOS)
1.66 (2p Thiol) | |||
CT5(TOS)5 on ODT/Au | B. E. (eV) | No binding | No binding | No binding | -- | -- |
Rel. Conc. (/Ru) | ||||||
CT5(PF6)5 Powder | B. E. (eV) | 462.7 (3p3/2)
484.5 (3p1/2) | 399.7 (1s) | -- | 135.9 (2p) | 686.5 (1s) |
Rel. Conc. (/Ru) | 1 | 6.08 | 2.42 | 14.8 | ||
CT5(PF6)5on SiO2 | B. E. (eV) | 461.5 (3p3/2)
484.5 (3p1/2) | 399.8 (1s) | -- | No binding | Bo binding |
Rel. Conc. (/Ru) | 1 | 6.40 |
Native SiO2 thickness before attachment of CT5 (Å) | 11.3 | 11.8 | 11.4 | 11.3 | 11.6 | 11.4 | 11.6 | Average 11.5±0.2 |
Total Native SiO2 and CT5 thickness after attachment (Å) | 18.0 | 18.6 | 17.6 | 17.9 | 17.8 | 18.1 | 17.6 | Average 17.9±0.5 |
Calculated CT5 monolayer thickness (Å) | 6.7 | 6.8 | 6.2 | 6.6 | 6.2 | 6.7 | 6.0 | Average 6.4±0.4 |
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Wang, Y.; Lieberman, M.; Hang, Q.; Bernstein, G. Selective Binding, Self-Assembly and Nanopatterning of the Creutz-Taube Ion on Surfaces. Int. J. Mol. Sci. 2009, 10, 533-558. https://doi.org/10.3390/ijms10020533
Wang Y, Lieberman M, Hang Q, Bernstein G. Selective Binding, Self-Assembly and Nanopatterning of the Creutz-Taube Ion on Surfaces. International Journal of Molecular Sciences. 2009; 10(2):533-558. https://doi.org/10.3390/ijms10020533
Chicago/Turabian StyleWang, Yuliang, Marya Lieberman, Qingling Hang, and Gary Bernstein. 2009. "Selective Binding, Self-Assembly and Nanopatterning of the Creutz-Taube Ion on Surfaces" International Journal of Molecular Sciences 10, no. 2: 533-558. https://doi.org/10.3390/ijms10020533