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Journal: Entropy, 2020
Volume: 22
Number: 295
Article:
Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography
Authors:
by
Yingzhi Wang, Tailin Han, Xu Jiang, Yuhan Yan and Hong Liu
Link:
https://www.mdpi.com/1099-4300/22/3/295
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