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Keywords = dual-laser plasma technique

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40 pages, 12881 KB  
Review
A Critical Review of Ultrasonic-Assisted Machining of Titanium Alloys
by Muhammad Fawad Jamil, Qilin Li, Mohammad Keymanesh, Pingfa Feng and Jianfu Zhang
Machines 2025, 13(9), 844; https://doi.org/10.3390/machines13090844 - 11 Sep 2025
Cited by 1 | Viewed by 1208
Abstract
Ultrasonic-assisted machining (UAM) has emerged as a transformative technology for increasing material removal efficiency, improving surface quality and extending tool life in precision manufacturing. This review specifically focuses on the application of it to titanium aluminide (TiAl) alloys. These alloys are widely used [...] Read more.
Ultrasonic-assisted machining (UAM) has emerged as a transformative technology for increasing material removal efficiency, improving surface quality and extending tool life in precision manufacturing. This review specifically focuses on the application of it to titanium aluminide (TiAl) alloys. These alloys are widely used in aerospace and automotive sectors due to their low density, high strength and poor machinability. This review covers various aspects of UAM, including ultrasonic vibration-assisted turning (UVAT), milling (UVAM) and grinding (UVAG), with emphasis on their influence on the machinability, tool wear behavior and surface integrity. It also highlights the limitations of single-energy field UAM, such as inconsistent energy transmission and tool fatigue, leading to the increasing demand for multi-field techniques. Therefore, the advanced machining strategies, i.e., ultrasonic plasma oxidation-assisted grinding (UPOAG), protective coating-assisted cutting, and dual-field ultrasonic integration (e.g., ultrasonic-magnetic or ultrasonic-laser machining), were discussed in terms of their potential to further improve TiAl alloys processing. In addition, the importance of predictive force models in optimizing UAM processes was also highlighted, emphasizing the role of analytical and AI-driven simulations for better process control. Overall, this review underscores the ongoing evolution of UAM as a cornerstone of high-efficiency and precision manufacturing, while providing a comprehensive outlook on its current applications and future potential in machining TiAl alloys. Full article
(This article belongs to the Special Issue Non-Conventional Machining Technologies for Advanced Materials)
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18 pages, 4621 KB  
Article
Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation
by Leopoldo Soto, Cristian Pavez, José Pedreros, Jalaj Jain, José Moreno, Patricio San Martín, Fermín Castillo, Daniel Zanelli and Luis Altamirano
Micromachines 2024, 15(9), 1123; https://doi.org/10.3390/mi15091123 - 1 Sep 2024
Viewed by 2636
Abstract
Plasma focus devices represent a class of hot and dense plasma sources that serve a dual role in fundamental plasma research and practical applications. These devices allow the observation of various phenomena, including the z-pinch effect, nuclear fusion reactions, plasma filaments, bursts, shocks, [...] Read more.
Plasma focus devices represent a class of hot and dense plasma sources that serve a dual role in fundamental plasma research and practical applications. These devices allow the observation of various phenomena, including the z-pinch effect, nuclear fusion reactions, plasma filaments, bursts, shocks, jets, X-rays, neutron pulses, ions, and electron beams. In recent years, considerable efforts have been directed toward miniaturizing plasma focus devices, driven by the pursuit of both basic studies and technological advancements. In this paper, we present the design and construction of a compact, portable pulsed plasma source based on plasma focus technology, operating at the ~2–4 Joule energy range for versatile applications (PF-2J: 120 nF capacitance, 6–9 kV charging voltage, 40 nH inductance, 2.16–4.86 J stored energy, and 10–15 kA maximum current at short circuit). The components of the device, including capacitors, spark gaps, discharge chambers, and power supplies, are transportable within hand luggage. The electrical characteristics of the discharge were thoroughly characterized using voltage and current derivative monitoring techniques. A peak current of 15 kiloamperes was achieved within 110 nanoseconds in a short-circuit configuration at a 9 kV charging voltage. Plasma dynamics were captured through optical refractive diagnostics employing a pulsed Nd-YAG laser with a 170-picosecond pulse duration. Clear evidence of the z-pinch effect was observed during discharges in a deuterium atmosphere at 4 millibars and 6 kilovolts. The measured pinch length and radius were approximately 0.8 mm and less than 100 μm, respectively. Additionally, we explore the potential applications of this compact pulsed plasma source. These include its use as a plasma shock irradiation device for analyzing materials intended for the first wall of nuclear fusion reactors, its capability in material film deposition, and its utility as an educational tool in experimental plasma physics. We also show its potential as a pulsed plasma thruster for nanosatellites, showcasing the advantages of miniaturized plasma focus technology. Full article
(This article belongs to the Special Issue Microreactors and Their Applications)
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8 pages, 1063 KB  
Article
The 5d-6p VUV Photoabsorption Spectrum of Bi+
by Hu Lu, Lazaros Varvarezos, Patrick Hayden, Eugene T Kennedy, Jean-Paul Mosnier and John T Costello
Atoms 2020, 8(3), 55; https://doi.org/10.3390/atoms8030055 - 4 Sep 2020
Cited by 3 | Viewed by 3193
Abstract
The photoabsorption spectrum of Bi+ was measured in the wavelength range between 37 and 60 nm, using the dual laser plasma technique in which one plasma is used as the source of vacuum ultraviolet continuum radiation and the other plasma is used [...] Read more.
The photoabsorption spectrum of Bi+ was measured in the wavelength range between 37 and 60 nm, using the dual laser plasma technique in which one plasma is used as the source of vacuum ultraviolet continuum radiation and the other plasma is used as the sample of atoms and/or ions to be probed. A number of features in the Bi+ spectrum was identified with the aid of the Cowan suite of atomic codes. The 5d → 6p transitions from the ground configuration (5d106s26p2) gave rise to the most prominent features in the measured spectrum. Transitions from low-lying excited states associated with the four excited configurations, 5d106s26p6d, 5d106s26p7s, 5d106s26p7p and 5d106s6p3, were found to make small contributions to the observed spectrum in the 47–50 nm spectral region. To the best of our knowledge, for Bi+, this spectral region is rather unexplored and spectroscopic data are absent from the literature. Full article
(This article belongs to the Special Issue Interaction of Ionizing Photons with Atomic and Molecular Ions)
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12 pages, 4851 KB  
Article
Design and Optimization of Plasmon Resonance Sensor Based on Micro–Nano Symmetrical Localized Surface
by Fengyu Yin, Jin Liu, Haima Yang, Aleksey Kudreyko and Bo Huang
Symmetry 2020, 12(5), 841; https://doi.org/10.3390/sym12050841 - 20 May 2020
Cited by 4 | Viewed by 3920
Abstract
Surface Plasma resonance (SPR) sensors combined with biological receptors are widely used in biosensors. Due to limitations of measurement techniques, small-scale, low accuracy, and sensitivity to the refractive index of solution in traditional SPR prism sensor arise. As a consequence, it is difficult [...] Read more.
Surface Plasma resonance (SPR) sensors combined with biological receptors are widely used in biosensors. Due to limitations of measurement techniques, small-scale, low accuracy, and sensitivity to the refractive index of solution in traditional SPR prism sensor arise. As a consequence, it is difficult to launch commercial production of SPR sensors. The theory of localized surface plasmon resonance (LSPR) developed based on SPR theory has stronger coupling ability to near-field photons. Based on the LSPR sensing theory, we propose a submicron-sized golden-disk and graphene composite structure. By varying the thickness and diameter of the array disk, the performance of the LSPR sensor can be optimized. A graphene layer sandwiched between the golden-disk and the silver film can prevent the latter from oxidizing. Symmetrical design enables high-low concentration of dual-channel distributed sensing. As the fixed light source, we use a 632.8-nm laser. A golden nano-disk with 45 nm thickness and 70 nm radius is designed, using a finite difference time domain (FDTD) simulation system. When the incident angle is 42°, the figure of merit (FOM) reaches 8826, and the measurable refractive index range reaches 0.2317. Full article
(This article belongs to the Special Issue Symmetry in Engineering Sciences Ⅲ)
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