Research Progress on the Preparation and Performance of Nickel Oxide Electrochromic Films
Abstract
1. Introduction
2. Preparation Methods of NiO Electrochromic Materials
2.1. Magnetron Sputtering
2.2. Hydrothermal Method
2.3. Electrodeposition
2.4. Chemical Bath Deposition
2.5. Sol–Gel Method
2.6. Spray Pyrolysis Method
3. Multifaceted Modification Strategies for Enhancing NiO Electrochromic Performance
3.1. Ion/Element Doping

| Doping Ion/Element | Preparation Method | ΔT (%) | CE (cm2/C) | tb/tc (s) | Cycle Stability (Cycles/% Retained) | Electrolyte | Ref. |
|---|---|---|---|---|---|---|---|
| V | Chemical bath deposition | 68 (630 nm) | 63.18 | 1.52/4.79 | 2000/91.95 | 2 M KOH | [34] |
| W | Magnetron sputtering | 52.7 (550 nm) | 37.4 | 7.2/8.8 | _ | 0.5 M PC-LiClO4 | [43] |
| Si, Li | Magnetron sputtering | 38.0 (550 nm) | _ | 2.4/8.8 | 100 | 1 M PC-LiClO4 | [47] |
| Ti | Solvothermal | 54.4 (550 nm) | 45.6 | 0.8/2.9 | 50,000 | 0.5 M KOH | [50] |
| Al | Spin coating | 58.4 (550 nm) | 54.2 | 1.8/4.2 | 2000/70 | 6 M KOH | [52] |
| Cu | Electrochemical deposition method | 57.1 (550 nm) | 13.78 | 2.26/1.77 | _ | 0.1 M KOH | [53] |
| Sn | Magnetron sputtering | 65.1 (550 nm) | 39.3 | 1.3/1.4 | 2000/70 | 1 M PC-LiClO4 | [54] |
| C | pyrolysis | 60.6 (550 nm) | 113.5 | 0.25/0.46 | 20,000/90.1 | 1 M KOH | [57] |
| Li, Ta | Magnetron sputtering | 62.0 (550 nm) | 35 | _ | _ | 1 M PC-LiClO4 | [58] |
| Zn | Hydrothermal | 68.6 (500 nm) | 52.49 | 3.8/6.4 | 5000/99.47 | 0.1 M KOH | [59] |
3.2. Design of Electrolyte
3.3. Design of Composite Materials
3.4. Heat Treatment and Annealing
3.5. Nanostructured Optimization
4. Application of NiO Electrochromic Thin Film
4.1. Smart Windows
4.2. Energy Management and Energy Storage Devices
4.3. Display Technology
4.4. Automotive and Aircraft Tinting Windows
4.5. Wearable Devices, Smart Glasses, and Electrochromic Mirrors

5. Conclusions and Perspectives
Funding
Data Availability Statement
Conflicts of Interest
References
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| Preparation Methods | Advantages | Disadvantages | Notes |
|---|---|---|---|
| Magnetron sputtering | 1. Uniform film 2. Suitable for large areas 3. Precise control of thickness and composition | 1. Expensive equipment 2. Slow sedimentation 3. High energy damage to brittle substrates | 1. Professional operation is required 2. Control energy to avoid substrate damage 3. Optimize parameter adjustment |
| Hydrothermal method | 1. Diverse morphology 2. High crystallinity 3. Improve response | 1. Complex process 2. Difficult to scale up 3. High-voltage equipment is required | 1. Accurate temperature and pressure control 2. Implement security measures 3. Maintain uniform heating |
| Electrodeposition | 1. Low cost 2. Strong control 3. Suitable for different thicknesses | 1. Poor membrane uniformity 2. Low adhesion 3. Parameters need to be finely tuned | 1. Optimize current density 2. Substrate pretreatment enhances adhesion 3. Control sedimentation parameters |
| Chemical bath deposition | 1. Low cost 2. Easy to expand 3. Simple process | 1. Low membrane density 2. Conditions must be strictly controlled 3. Post-processing is required to improve | 1. Control temperature and stirring 2. Regularly monitor the purity of the solution 3. Subsequent annealing improves film quality |
| Sol–gel method | 1. Low temperature processing 2. Uniform film layer 3. Composition adjustable | 1. Poor ion exchange performance 2. Easy to crack 3. Difficulty in drying control | 1. Maintain sol stability 2. Precise control of uniform coating 3. Heat treatment improves performance |
| Spray pyrolysis | 1. Easy to operate 2. Suitable for large areas 3. Can be doped and adjusted | 1. The film quality is affected by the nozzle 2. Uniformity needs to be controlled 3. Environmental Impact | 1. Optimize spraying parameters 2. Adjust the solution to match the membrane characteristics 3. Control environmental stability |
| Materials | Preparation Method | ΔT (%) | CE (cm2/C) | tb/tc (s) | Cycle Stability (Cycles/% Retained) | Electrolyte | Ref. |
|---|---|---|---|---|---|---|---|
| NiO/PANI | Electrodeposition and CBD | ~74 (550 nm) | 85 | _ | 10,000 | 1 M PC-LiClO4 | [14] |
| rGO/NiO | electrodeposition | 53 (630 nm) | 30.5 | 3.4/5.3 | 1000/~100 | 1 M KOH | [64] |
| NiO/CdS | Hydrothermal method | 54.7 (550 nm) | _ | 4.8/3.9 | 1000 | 1 M PC-LiClO4 | [65] |
| NiO/AgNWs | CBD | 56.4 (532 nm) | 60.5 | 6.5/5.4 | _ | 2 M KOH | [66] |
| NiO/TiO2 | hot solvent and hydrothermal method | 71 (550 nm) | 147.6 | 4.0/3.8 | 3000/67 | 0.5 M KOH | [67] |
| Co3O4/NiO | Hydrothermal method and intermittent annealing | 65.2 (600 nm) | 104.8 | 5.9/4.7 | _ | 1 M PC-LiClO4 | [68] |
| NiO/V2O5 | CBD and electrodeposition | 35 (776 nm) | 30.6 | 11/8 | _ | 1 M PC-LiClO4 | [69] |
| NiO/PB | Hydrothermal, annealing and electrodeposition | 67.6 (630 nm) | 109.6 | 7.9/2.8 | _ | 1 M PC-LiClO4 | [70] |
| NiO/PPy | Electrodeposition and CBD | ~50 (630 nm) | 358 | 0.395/0.601 | 10,000 | 1 M PC-LiClO4 | [71] |
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Chen, P.; Tan, R.; Nazir, M.; Li, J.; Song, W. Research Progress on the Preparation and Performance of Nickel Oxide Electrochromic Films. Nanoenergy Adv. 2026, 6, 10. https://doi.org/10.3390/nanoenergyadv6010010
Chen P, Tan R, Nazir M, Li J, Song W. Research Progress on the Preparation and Performance of Nickel Oxide Electrochromic Films. Nanoenergy Advances. 2026; 6(1):10. https://doi.org/10.3390/nanoenergyadv6010010
Chicago/Turabian StyleChen, Peihua, Ruiqin Tan, Maria Nazir, Jia Li, and Weijie Song. 2026. "Research Progress on the Preparation and Performance of Nickel Oxide Electrochromic Films" Nanoenergy Advances 6, no. 1: 10. https://doi.org/10.3390/nanoenergyadv6010010
APA StyleChen, P., Tan, R., Nazir, M., Li, J., & Song, W. (2026). Research Progress on the Preparation and Performance of Nickel Oxide Electrochromic Films. Nanoenergy Advances, 6(1), 10. https://doi.org/10.3390/nanoenergyadv6010010

