Scattolo, E.; Cian, A.; Giubertoni, D.; Paternoster, G.; Petti, L.; Lugli, P.
Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes. Eng. Proc. 2021, 10, 2.
https://doi.org/10.3390/ecsa-8-11259
AMA Style
Scattolo E, Cian A, Giubertoni D, Paternoster G, Petti L, Lugli P.
Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes. Engineering Proceedings. 2021; 10(1):2.
https://doi.org/10.3390/ecsa-8-11259
Chicago/Turabian Style
Scattolo, Elia, Alessandro Cian, Damiano Giubertoni, Giovanni Paternoster, Luisa Petti, and Paolo Lugli.
2021. "Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes" Engineering Proceedings 10, no. 1: 2.
https://doi.org/10.3390/ecsa-8-11259
APA Style
Scattolo, E., Cian, A., Giubertoni, D., Paternoster, G., Petti, L., & Lugli, P.
(2021). Optimization of Focused Ion Beam Patterning Parameters for Direct Integration of Plasmonic Nanostructures on Silicon Photodiodes. Engineering Proceedings, 10(1), 2.
https://doi.org/10.3390/ecsa-8-11259