Article Versions Notes

Knoblich M, Uwurukundo X, Stumpf D, Kraus M, Hillmer H, Brunner R. Annular Gray Tone Lithography for the Fabrication of Rotationally Symmetric Continuous Relief Meso- and Microscale Optical Elements. Photonics. 2023; 10(9):1000. https://doi.org/10.3390/photonics10091000

Knoblich, Maria, Xavier Uwurukundo, Daniela Stumpf, Matthias Kraus, Hartmut Hillmer, and Robert Brunner. 2023. "Annular Gray Tone Lithography for the Fabrication of Rotationally Symmetric Continuous Relief Meso- and Microscale Optical Elements" Photonics 10, no. 9: 1000. https://doi.org/10.3390/photonics10091000

Knoblich, M., Uwurukundo, X., Stumpf, D., Kraus, M., Hillmer, H., & Brunner, R. (2023). Annular Gray Tone Lithography for the Fabrication of Rotationally Symmetric Continuous Relief Meso- and Microscale Optical Elements. Photonics, 10(9), 1000. https://doi.org/10.3390/photonics10091000