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Journal: Processes, 2020
Volume: 8
Number: 18

Article: Integrating Feedback Control and Run-to-Run Control in Multi-Wafer Thermal Atomic Layer Deposition of Thin Films
Authors: by Yichi Zhang, Yangyao Ding and Panagiotis D. Christofides
Link: https://www.mdpi.com/2227-9717/8/1/18

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