Herrera RÃos, E.; Marulanda, M.; Arboleda, H.; Soule, G.; Lucuara, E.; Jaramillo, D.; Cardona, A.; Taborda, E.A.; Cortés, F.B.; Franco, C.A.
Automatic Delineation of Resistivity Contrasts in Magnetotelluric Models Using Machine Learning. Processes 2025, 13, 2263.
https://doi.org/10.3390/pr13072263
AMA Style
Herrera RÃos E, Marulanda M, Arboleda H, Soule G, Lucuara E, Jaramillo D, Cardona A, Taborda EA, Cortés FB, Franco CA.
Automatic Delineation of Resistivity Contrasts in Magnetotelluric Models Using Machine Learning. Processes. 2025; 13(7):2263.
https://doi.org/10.3390/pr13072263
Chicago/Turabian Style
Herrera RÃos, Ever, Mateo Marulanda, Hernán Arboleda, Greg Soule, Erika Lucuara, David Jaramillo, AgustÃn Cardona, Esteban A. Taborda, Farid B. Cortés, and Camilo A. Franco.
2025. "Automatic Delineation of Resistivity Contrasts in Magnetotelluric Models Using Machine Learning" Processes 13, no. 7: 2263.
https://doi.org/10.3390/pr13072263
APA Style
Herrera RÃos, E., Marulanda, M., Arboleda, H., Soule, G., Lucuara, E., Jaramillo, D., Cardona, A., Taborda, E. A., Cortés, F. B., & Franco, C. A.
(2025). Automatic Delineation of Resistivity Contrasts in Magnetotelluric Models Using Machine Learning. Processes, 13(7), 2263.
https://doi.org/10.3390/pr13072263
