Article Versions Notes

Fetisenkova K, Melnikov A, Kuzmenko V, Miakonkikh A, Rogozhin A, Tatarintsev A, Glaz O, Kiselevsky V. Mechanism of Improving Etching Selectivity for E-Beam Resist AR-N 7520 in the Formation of Photonic Silicon Structures. Processes. 2024; 12(9):1941. https://doi.org/10.3390/pr12091941

Fetisenkova, Ksenia, Alexander Melnikov, Vitaly Kuzmenko, Andrey Miakonkikh, Alexander Rogozhin, Andrey Tatarintsev, Oleg Glaz, and Vsevolod Kiselevsky. 2024. "Mechanism of Improving Etching Selectivity for E-Beam Resist AR-N 7520 in the Formation of Photonic Silicon Structures" Processes 12, no. 9: 1941. https://doi.org/10.3390/pr12091941

Fetisenkova, K., Melnikov, A., Kuzmenko, V., Miakonkikh, A., Rogozhin, A., Tatarintsev, A., Glaz, O., & Kiselevsky, V. (2024). Mechanism of Improving Etching Selectivity for E-Beam Resist AR-N 7520 in the Formation of Photonic Silicon Structures. Processes, 12(9), 1941. https://doi.org/10.3390/pr12091941