Woo-GarcÃa, R.M.; RodrÃguez-Ibarra, I.; Osorio-de-la-Rosa, E.; Guarneros-Aguilar, C.; Caballero-Briones, F.; AgustÃn-Serrano, R.; Herrera-May, A.L.; López-Huerta, F.
Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction. Processes 2022, 10, 492.
https://doi.org/10.3390/pr10030492
AMA Style
Woo-GarcÃa RM, RodrÃguez-Ibarra I, Osorio-de-la-Rosa E, Guarneros-Aguilar C, Caballero-Briones F, AgustÃn-Serrano R, Herrera-May AL, López-Huerta F.
Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction. Processes. 2022; 10(3):492.
https://doi.org/10.3390/pr10030492
Chicago/Turabian Style
Woo-GarcÃa, Rosa M., Isaac RodrÃguez-Ibarra, Edith Osorio-de-la-Rosa, Cesia Guarneros-Aguilar, Felipe Caballero-Briones, Ricardo AgustÃn-Serrano, AgustÃn L. Herrera-May, and Francisco López-Huerta.
2022. "Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction" Processes 10, no. 3: 492.
https://doi.org/10.3390/pr10030492
APA Style
Woo-GarcÃa, R. M., RodrÃguez-Ibarra, I., Osorio-de-la-Rosa, E., Guarneros-Aguilar, C., Caballero-Briones, F., AgustÃn-Serrano, R., Herrera-May, A. L., & López-Huerta, F.
(2022). Automated Instrument for the Deposition of Thin Films Using Successive Ionic Layer Adsorption and Reaction. Processes, 10(3), 492.
https://doi.org/10.3390/pr10030492
