Raji, I.A.; Lee, M.H.; Riaz, M.; Abujiya, M.R.; Abbas, N.
Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry. Mathematics 2020, 8, 857.
https://doi.org/10.3390/math8050857
AMA Style
Raji IA, Lee MH, Riaz M, Abujiya MR, Abbas N.
Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry. Mathematics. 2020; 8(5):857.
https://doi.org/10.3390/math8050857
Chicago/Turabian Style
Raji, Ishaq Adeyanju, Muhammad Hisyam Lee, Muhammad Riaz, Mu’azu Ramat Abujiya, and Nasir Abbas.
2020. "Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry" Mathematics 8, no. 5: 857.
https://doi.org/10.3390/math8050857
APA Style
Raji, I. A., Lee, M. H., Riaz, M., Abujiya, M. R., & Abbas, N.
(2020). Outliers Detection Models in Shewhart Control Charts; an Application in Photolithography: A Semiconductor Manufacturing Industry. Mathematics, 8(5), 857.
https://doi.org/10.3390/math8050857