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Journal: Mathematics, 2024
Volume: 12
Number: 2688

Article: Improving Ti Thin Film Resistance Deviations in Physical Vapor Deposition Sputtering for Dynamic Random-Access Memory Using Dynamic Taguchi Method, Artificial Neural Network and Genetic Algorithm
Authors: by Chia-Ming Lin and Shang-Liang Chen
Link: https://www.mdpi.com/2227-7390/12/17/2688

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