Celiberto, R.; Capitelli, M.; Colonna, G.; D’Ammando, G.; Esposito, F.; Janev, R.K.; Laporta, V.; Laricchiuta, A.; Pietanza, L.D.; Rutigliano, M.;
et al. Elementary Processes and Kinetic Modeling for Hydrogen and Helium Plasmas. Atoms 2017, 5, 18.
https://doi.org/10.3390/atoms5020018
AMA Style
Celiberto R, Capitelli M, Colonna G, D’Ammando G, Esposito F, Janev RK, Laporta V, Laricchiuta A, Pietanza LD, Rutigliano M,
et al. Elementary Processes and Kinetic Modeling for Hydrogen and Helium Plasmas. Atoms. 2017; 5(2):18.
https://doi.org/10.3390/atoms5020018
Chicago/Turabian Style
Celiberto, Roberto, Mario Capitelli, Gianpiero Colonna, Giuliano D’Ammando, Fabrizio Esposito, Ratko K. Janev, Vincenzo Laporta, Annarita Laricchiuta, Lucia Daniela Pietanza, Maria Rutigliano,
and et al. 2017. "Elementary Processes and Kinetic Modeling for Hydrogen and Helium Plasmas" Atoms 5, no. 2: 18.
https://doi.org/10.3390/atoms5020018
APA Style
Celiberto, R., Capitelli, M., Colonna, G., D’Ammando, G., Esposito, F., Janev, R. K., Laporta, V., Laricchiuta, A., Pietanza, L. D., Rutigliano, M., & Wadehra, J. M.
(2017). Elementary Processes and Kinetic Modeling for Hydrogen and Helium Plasmas. Atoms, 5(2), 18.
https://doi.org/10.3390/atoms5020018