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Journal: Electronics, 2023
Volume: 12
Number: 543
Article:
Influence of Bulk Doping and Halos on the TID Response of I/O and Core 150 nm nMOSFETs
Authors:
by
Stefano Bonaldo, Serena Mattiazzo, Marta Bagatin, Alessandro Paccagnella, Giovanni Margutti and Simone Gerardin
Link:
https://www.mdpi.com/2079-9292/12/3/543
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