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Journal: Electronics, 2023
Volume: 12
Number: 543

Article: Influence of Bulk Doping and Halos on the TID Response of I/O and Core 150 nm nMOSFETs
Authors: by Stefano Bonaldo, Serena Mattiazzo, Marta Bagatin, Alessandro Paccagnella, Giovanni Margutti and Simone Gerardin
Link: https://www.mdpi.com/2079-9292/12/3/543

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