Glancing Angle Deposition of Zn-Doped Calcium Phosphate Coatings by RF Magnetron Sputtering
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
3.1. Effect of GLAD on Coating Thickness and Its Uniformity along the Substrate Surface
3.2. Effect of GLAD on Coating Topography and Roughness
3.3. Effect of GLAD on Coating Crystallinity and Scratch Resistance
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Ref. | Method | Aim of Research | Target | Substrate | Deposition Parameters | Result |
---|---|---|---|---|---|---|
[23] | DC magnetron sputtering | The expansion of the well-known model of the Thornton spatial zone, including the inclination angle of the substrate as an additional degree of freedom | Ti | Si (100) | L = 22 cm | For α = 70°, a columnar morphology was formed consisting of vertically aligned and well-separated columns with diameters ranging from 50 to 100 nm. For angles of α = 80° and α = 85°, the structure was rather similar. |
t = 90–200 min | ||||||
P = 0.15–1.5 Pa | ||||||
W = 300 W | ||||||
[40] | DC magnetron sputtering | The effect of changing various parameters on the roughness | Mo and Ti/C:H | Silicon and Glass | L = 7–10 cm | The manipulation of the substrate led to the formation of a zigzag columnar structure. The films prepared in the range of 40–85° showed an increase in the RMS value of roughness from 7 to 55 nm. |
P = 0.08; 0.16 Pa | ||||||
[41] | DC magnetron sputtering | Influence on structural and optical properties | ZnO | Si (100) | L = 15 cm | The typical columnar structure was inclined and compact. SEM images showed that the typical columnar structure was inclined, and the column inclination angle was changed from 0 to 34°. From XRD analysis, it was shown that the strains in the ZnO films decreased with the substrate tilt angle. |
t = 180 min | ||||||
P = 0.64 Pa | ||||||
W = 400 W | ||||||
[42] | Reactive magnetron sputtering | Effect on the refractive index | ZnO | Si (100) | L = 14; 28.5 cm | The films were porous and of an inclined columnar structure, with columns tilting in the direction of the incident flux. |
t = 30 min | ||||||
P = 0.3 Pa | ||||||
W = 100 W | ||||||
[43] | RF magnetron sputtering | Structural, optical, and electrical properties of zinc oxide (AZO) films doped with aluminum on Si substrate | AZO (aluminum-doped zinc oxide) | Si (100) | L = 15 cm | The deposited AZO films had nanocolumnar structures. In tilted angle sputtering, the nanocolumns were tilted away from the surface normal to the incident AZO flux direction. When the substrate was not rotated, the nanocolumn inclination increased with apparently distinguishable grain boundaries as the tilted angle became larger. |
P = 0.67 Pa | ||||||
W = 50–150 W | ||||||
[44] | DC magnetron sputtering | Study of the effect of gas pressure (Ar) on the columnar growth of gold nanostructures, and a comparison of morphology with theoretical modeling. | Au | Si (100) | L = 19 cm | At low pressures, a ballistic deposition regime dominated, yielding high directional atoms that form tilted nanocolumns. Higher pressure led to a diffusive regime, which gave rise to vertical columnar growth. |
t = 30 min | ||||||
P = 0.15–0.4 Pa | ||||||
W = 100 W | ||||||
[24] | DC magnetron sputtering | To increase the photocatalytic activity | Ti | Si | L = 11 cm | TiO2 samples had adiscrete columnar nanostructure and efficiently performed a photocatalytic decolorization under UV radiation. |
P = 0.11 Pa | ||||||
W = 200 W | ||||||
[25] | Reactive magnetron sputtering | The influence of collimators on the growth of highly porous structures | Ti | Si and Quartz | L = 7; 10 cm | Particle collimators allowed for the growth of highly porous nanocolumnar thin films independently from the thermal degree of the sputtered particles. Using collimators, similar well-defined tilted nanocolumnar structures were prepared independently of the plasma pressure during the deposition. |
t = 210; 360 min | ||||||
P = 0.2; 0.5; 0.8 Pa | ||||||
[45] | DC magnetron sputtering | Identification of the presence of critical zones in certain properties of inclined columnar coatings | Al, Ti, Cr | Si (100) | L = 10.5 cm | Chromium coatings presented elongated columns perpendicular to the main direction of the incident flux. Titanium coatings had a dense nodular morphology. At an angle of 85°, the aluminum coatings had a rough surface with crystallite columns randomly distributed and oriented towards the target. The high aluminum adatoms mobility explained the dense film at normal deposition and the formation of large crystals with high porosity at an oblique angle. The chromium films still present elongated columns perpendicular to the main direction of the incident flux. |
t = 16; 19; 35 min | ||||||
P = 0.09 Pa | ||||||
W = 1500 W | ||||||
[46] | RF magnetron sputtering | Optical and the structural properties | ZnO | Si (100) | L = 10 cm | The GLAD ZnO films were mixtures of columnar structure and pores. The highly-oriented columnar structure of slanted columns indicated that the GLAD ZnO films were anisotropic with the long axis parallel to the columnar growth direction. This anisotropic structure will introduce an anisotropic dependence into the optical, electrical, thermal, and magnetic properties of the films. |
t = 16; 19; 35 min | ||||||
P = 0.67 Pa | ||||||
W = 80 W |
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Prosolov, K.A.; Belyavskaya, O.A.; Linders, J.; Loza, K.; Prymak, O.; Mayer, C.; Rau, J.V.; Epple, M.; Sharkeev, Y.P. Glancing Angle Deposition of Zn-Doped Calcium Phosphate Coatings by RF Magnetron Sputtering. Coatings 2019, 9, 220. https://doi.org/10.3390/coatings9040220
Prosolov KA, Belyavskaya OA, Linders J, Loza K, Prymak O, Mayer C, Rau JV, Epple M, Sharkeev YP. Glancing Angle Deposition of Zn-Doped Calcium Phosphate Coatings by RF Magnetron Sputtering. Coatings. 2019; 9(4):220. https://doi.org/10.3390/coatings9040220
Chicago/Turabian StyleProsolov, Konstantin A., Olga A. Belyavskaya, Juergen Linders, Kateryna Loza, Oleg Prymak, Christian Mayer, Julietta V. Rau, Matthias Epple, and Yurii P. Sharkeev. 2019. "Glancing Angle Deposition of Zn-Doped Calcium Phosphate Coatings by RF Magnetron Sputtering" Coatings 9, no. 4: 220. https://doi.org/10.3390/coatings9040220