The Fabrication of a UV Notch Filter by Using Solid State Diffusion
National Applied Research Laboratories, Taiwan Instrument Research Institute, Hsinchu 30076, Taiwan
Department of Optics and Photonics, National Central University, Chungli 32001, Taiwan
Authors to whom correspondence should be addressed.
Coatings 2019, 9(3), 208; https://doi.org/10.3390/coatings9030208
Received: 26 February 2019 / Revised: 15 March 2019 / Accepted: 20 March 2019 / Published: 23 March 2019
(This article belongs to the Special Issue Design, Manufacturing and Measurement of Optical Film Coatings)
One of the methods used to obtain notch filters involves one or several gradient index layers. In this method, the indices are decreased and then increased step by step to create a sinusoidal-like gradient layer. This paper reports a sinusoidal-like gradient layer fabrication method based on solid state diffusion. Al2O3/MgO/Al2O3 (AMA) was deposited by electron beam evaporation and then post-annealed at 800 °C for 4 h. Through inner diffusion, the MgO layers became a low refractive index material with a porous structure (the average refractive index was 1.55) such that the MgAl2O4 spinel was formed as an inhomogeneous layer with an average refractive index of 1.69. This allowed simply using a structured multilayer, (Al2O3/MgO)8 Al2O3, and post-annealing to form a sinusoidal-like gradient layer for a UV notch filter.