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Journal: Coatings, 2018
Volume: 8
Number: 417
Article:
Study on the Physical and Leakage Current Characteristics of an Optimized High-k/InAlAs MOS Capacitor with a HfO2–Al2O3 Laminated Dielectric
Authors:
by
He Guan and Chengyu Jiang
Link:
https://www.mdpi.com/2079-6412/8/12/417
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