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Journal: Coatings, 2025
Volume: 15
Number: 319
Article:
Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique
Authors:
by
Espedito Vassallo, Matteo Pedroni, Miriam Saleh, Daniele Minelli, Giuseppe Firpo, Enrico Miorin, Silvia Maria Deambrosis, Valentina Zin, Dario Ripamonti and Luca Origo
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