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Journal: Coatings, 2025
Volume: 15
Number: 319
319
Article: Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique
Authors: by Espedito Vassallo, Matteo Pedroni, Miriam Saleh, Daniele Minelli, Giuseppe Firpo, Enrico Miorin, Silvia Maria Deambrosis, Valentina Zin, Dario Ripamonti and Luca Origo
Link: https://www.mdpi.com/2079-6412/15/3/319

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