Hachikubo, Y.; Hayashi, H.; Ando, M.; Morita, M.; Oshima, M.; Hashim, A.M.; Azhan, N.H.; Ota, T.; Takei, S.
Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography. Coatings 2025, 15, 1228.
https://doi.org/10.3390/coatings15101228
AMA Style
Hachikubo Y, Hayashi H, Ando M, Morita M, Oshima M, Hashim AM, Azhan NH, Ota T, Takei S.
Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography. Coatings. 2025; 15(10):1228.
https://doi.org/10.3390/coatings15101228
Chicago/Turabian Style
Hachikubo, Yuna, Hiryu Hayashi, Mano Ando, Mayu Morita, Misaki Oshima, Abdul Manaf Hashim, Nurul Hanis Azhan, Takayuki Ota, and Satoshi Takei.
2025. "Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography" Coatings 15, no. 10: 1228.
https://doi.org/10.3390/coatings15101228
APA Style
Hachikubo, Y., Hayashi, H., Ando, M., Morita, M., Oshima, M., Hashim, A. M., Azhan, N. H., Ota, T., & Takei, S.
(2025). Water-Developable PFAS-Free Glycan-Derived Positive Photoresist Materials for Environmentally Friendly Lithography. Coatings, 15(10), 1228.
https://doi.org/10.3390/coatings15101228
