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Journal: Coatings, 2025
Volume: 15
Number: 22

Article: Atomic Layer Deposition of Y2O3 Thin Films Using Y(MeCp)2(iPr-nPrAMD) Precursor and H2O, and Their Erosion Resistance in CF4-Based Plasma
Authors: by Seong Lee, Hyunchang Kim and Sehun Kwon
Link: https://www.mdpi.com/2079-6412/15/1/22

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