Cheng, Y.-L.; Kao, J.; Zhang, H.-W.; Liao, B.-J.; Chen, G.-S.; Fang, J.-S.
Integration of Self-Assembled Monolayers for Cobalt/Porous Low-k Interconnects. Coatings 2024, 14, 1162.
https://doi.org/10.3390/coatings14091162
AMA Style
Cheng Y-L, Kao J, Zhang H-W, Liao B-J, Chen G-S, Fang J-S.
Integration of Self-Assembled Monolayers for Cobalt/Porous Low-k Interconnects. Coatings. 2024; 14(9):1162.
https://doi.org/10.3390/coatings14091162
Chicago/Turabian Style
Cheng, Yi-Lung, Joe Kao, Hao-Wei Zhang, Bo-Jie Liao, Giin-Shan Chen, and Jau-Shiung Fang.
2024. "Integration of Self-Assembled Monolayers for Cobalt/Porous Low-k Interconnects" Coatings 14, no. 9: 1162.
https://doi.org/10.3390/coatings14091162
APA Style
Cheng, Y.-L., Kao, J., Zhang, H.-W., Liao, B.-J., Chen, G.-S., & Fang, J.-S.
(2024). Integration of Self-Assembled Monolayers for Cobalt/Porous Low-k Interconnects. Coatings, 14(9), 1162.
https://doi.org/10.3390/coatings14091162