Liu, S.; Li, X.; Li, G.; Yan, S.; Zhu, Y.; Wu, Y.; Jiang, Q.; Zhan, Y.; Tang, M.
In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity. Coatings 2024, 14, 1121.
https://doi.org/10.3390/coatings14091121
AMA Style
Liu S, Li X, Li G, Yan S, Zhu Y, Wu Y, Jiang Q, Zhan Y, Tang M.
In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity. Coatings. 2024; 14(9):1121.
https://doi.org/10.3390/coatings14091121
Chicago/Turabian Style
Liu, Shikai, Xingyu Li, Gang Li, Shaoan Yan, Yingfang Zhu, Yujie Wu, Qin Jiang, Yang Zhan, and Minghua Tang.
2024. "In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity" Coatings 14, no. 9: 1121.
https://doi.org/10.3390/coatings14091121
APA Style
Liu, S., Li, X., Li, G., Yan, S., Zhu, Y., Wu, Y., Jiang, Q., Zhan, Y., & Tang, M.
(2024). In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity. Coatings, 14(9), 1121.
https://doi.org/10.3390/coatings14091121
