Rafailov, P.; Mehandzhiev, V.; Sveshtarov, P.; Blagoev, B.; Terziyska, P.; Avramova, I.; Kirilov, K.; Ranguelov, B.; Avdeev, G.; Petrov, S.;
et al. Atomic Layer Deposition Growth and Characterization of Al2O3 Layers on Cu-Supported CVD Graphene. Coatings 2024, 14, 662.
https://doi.org/10.3390/coatings14060662
AMA Style
Rafailov P, Mehandzhiev V, Sveshtarov P, Blagoev B, Terziyska P, Avramova I, Kirilov K, Ranguelov B, Avdeev G, Petrov S,
et al. Atomic Layer Deposition Growth and Characterization of Al2O3 Layers on Cu-Supported CVD Graphene. Coatings. 2024; 14(6):662.
https://doi.org/10.3390/coatings14060662
Chicago/Turabian Style
Rafailov, Peter, Vladimir Mehandzhiev, Peter Sveshtarov, Blagoy Blagoev, Penka Terziyska, Ivalina Avramova, Kiril Kirilov, Bogdan Ranguelov, Georgi Avdeev, Stefan Petrov,
and et al. 2024. "Atomic Layer Deposition Growth and Characterization of Al2O3 Layers on Cu-Supported CVD Graphene" Coatings 14, no. 6: 662.
https://doi.org/10.3390/coatings14060662
APA Style
Rafailov, P., Mehandzhiev, V., Sveshtarov, P., Blagoev, B., Terziyska, P., Avramova, I., Kirilov, K., Ranguelov, B., Avdeev, G., Petrov, S., & Lin, S. H.
(2024). Atomic Layer Deposition Growth and Characterization of Al2O3 Layers on Cu-Supported CVD Graphene. Coatings, 14(6), 662.
https://doi.org/10.3390/coatings14060662