Article Versions Notes

Wang B, Zhang J, Liu H, Yang H, Wang Y, Wang H, Pan J, Liu Z, Shen Z, Gao W, et al. Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO₂ Thin Films. Coatings. 2024; 14(12):1616. https://doi.org/10.3390/coatings14121616

Wang, Bo, Jian Zhang, Hai Liu, Haigui Yang, Yanchao Wang, Haifeng Wang, Jingjie Pan, Zhen Liu, Zhenfeng Shen, Wenkai Gao, and et al. 2024. "Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO₂ Thin Films" Coatings 14, no. 12: 1616. https://doi.org/10.3390/coatings14121616

Wang, B., Zhang, J., Liu, H., Yang, H., Wang, Y., Wang, H., Pan, J., Liu, Z., Shen, Z., Gao, W., Hu, H., Zhao, Y., Tang, H., Wang, T., & Wang, X. (2024). Effect of Ion-Assisted Deposition Energy of RF Source on Optical Properties, Microstructure, and Residual Stress of HfO₂ Thin Films. Coatings, 14(12), 1616. https://doi.org/10.3390/coatings14121616