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Journal: Coatings, 2023
Volume: 13
Number: 559
Article:
In Situ Plasma Impedance Monitoring of the Oxide Layer PECVD Process
Authors:
by
Hyun Keun Park, Wan Soo Song and Sang Jeen Hong
Link:
https://www.mdpi.com/2079-6412/13/3/559
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