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Journal: Coatings, 2022
Volume: 12
Number: 679

Article: Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8
Authors: by Sanghyun You, Yu Jong Lee, Heeyeop Chae and Chang-Koo Kim
Link: https://www.mdpi.com/2079-6412/12/5/679

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