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Journal: Coatings, 2022
Volume: 12
Number: 679
Article:
Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8
Authors:
by
Sanghyun You, Yu Jong Lee, Heeyeop Chae and Chang-Koo Kim
Link:
https://www.mdpi.com/2079-6412/12/5/679
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