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Journal: Coatings, 2022
Volume: 12
Number: 394
394
Article: Influence of Target Current on Structure and Performance of Cu Films Deposited by Oscillating Pulse Magnetron Sputtering
Authors: by Rong Wang, Chao Yang, Juan Hao, Jing Shi, Fangyuan Yan, Nan Zhang, Bailing Jiang and Wenting Shao
Link: https://www.mdpi.com/2079-6412/12/3/394

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