Rogozhin, A.; Miakonkikh, A.; Smirnova, E.; Lomov, A.; Simakin, S.; Rudenko, K.
Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor. Coatings 2021, 11, 117.
https://doi.org/10.3390/coatings11020117
AMA Style
Rogozhin A, Miakonkikh A, Smirnova E, Lomov A, Simakin S, Rudenko K.
Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor. Coatings. 2021; 11(2):117.
https://doi.org/10.3390/coatings11020117
Chicago/Turabian Style
Rogozhin, Alexander, Andrey Miakonkikh, Elizaveta Smirnova, Andrey Lomov, Sergey Simakin, and Konstantin Rudenko.
2021. "Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor" Coatings 11, no. 2: 117.
https://doi.org/10.3390/coatings11020117
APA Style
Rogozhin, A., Miakonkikh, A., Smirnova, E., Lomov, A., Simakin, S., & Rudenko, K.
(2021). Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor. Coatings, 11(2), 117.
https://doi.org/10.3390/coatings11020117