Order Article Reprints

Xie J, Zhu Z, Tao H, Zhou S, Liang Z, Li Z, Yao R, Wang Y, Ning H, Peng J. Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application. Coatings. 2020; 10(7):698. https://doi.org/10.3390/coatings10070698

Xie, Junan, Zhennan Zhu, Hong Tao, Shangxiong Zhou, Zhihao Liang, Zhihang Li, Rihui Yao, Yiping Wang, Honglong Ning, and Junbiao Peng. 2020. "Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application" Coatings 10, no. 7: 698. https://doi.org/10.3390/coatings10070698

Xie, J., Zhu, Z., Tao, H., Zhou, S., Liang, Z., Li, Z., Yao, R., Wang, Y., Ning, H., & Peng, J. (2020). Research Progress of High Dielectric Constant Zirconia-Based Materials for Gate Dielectric Application. Coatings, 10(7), 698. https://doi.org/10.3390/coatings10070698