Tiron, V.; Velicu, I.-L.; Matei, T.; Cristea, D.; Cunha, L.; Stoian, G.
Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties. Coatings 2020, 10, 633.
https://doi.org/10.3390/coatings10070633
AMA Style
Tiron V, Velicu I-L, Matei T, Cristea D, Cunha L, Stoian G.
Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties. Coatings. 2020; 10(7):633.
https://doi.org/10.3390/coatings10070633
Chicago/Turabian Style
Tiron, Vasile, Ioana-Laura Velicu, Teodora Matei, Daniel Cristea, Luis Cunha, and George Stoian.
2020. "Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties" Coatings 10, no. 7: 633.
https://doi.org/10.3390/coatings10070633
APA Style
Tiron, V., Velicu, I.-L., Matei, T., Cristea, D., Cunha, L., & Stoian, G.
(2020). Ultra-Short Pulse HiPIMS: A Strategy to Suppress Arcing during Reactive Deposition of SiO2 Thin Films with Enhanced Mechanical and Optical Properties. Coatings, 10(7), 633.
https://doi.org/10.3390/coatings10070633