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Journal: CoatingsVolume: 10Number: 542
Article: Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films
- Authors:
- Chin-Chiuan Kuo1,*,
- Chun-Hui Lin1 and
- Yu-Tse Lin2
- et al.
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