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Journal: Coatings, 2020
Volume: 10
Number: 232
232
Article: Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
Authors: by Zdenek Hubička, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada and Josef Krýsa
Link: https://www.mdpi.com/2079-6412/10/3/232

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