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Article

Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD)

1
Department of Mechanical Engineering, National Taiwan University, Taipei 10617, Taiwan
2
Material and Chemical Research Laboratories, Industrial Technology Research Institute, Hsin-Chu 31040, Taiwan
*
Author to whom correspondence should be addressed.
Nanomaterials 2019, 9(9), 1332; https://doi.org/10.3390/nano9091332
Received: 13 August 2019 / Revised: 11 September 2019 / Accepted: 16 September 2019 / Published: 18 September 2019
(This article belongs to the Special Issue Carbon Nanotube: Synthesis, Characteristics and Applications)
This study introduces a method of patterning carbon nanotube (CNTs) forests that is both fast and simple. We found that, as commercially available oil-based markers undergo nanotube synthesis, a thin film forms that prevents the catalyst, ferrocene, from coming into contact with the surface of the test sample. This, thus, blocks CNT growth. Through further deduction, we used styrene maleic anhydride (SMA) to conduct CNT patterning, in addition to analyzing the relationship between the weight percent concentration of the SMA and the extent to which it blocked CNT growth. We developed two separate methods for applying ink to soft and hard substrates: one method involved ink printing and the other laser stripping. In the CNT pattern we produced, a minimum line width of around 10 µm was attained. View Full-Text
Keywords: carbon nanotubes; patterning; ferrocene; styrene maleic anhydride; ink carbon nanotubes; patterning; ferrocene; styrene maleic anhydride; ink
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MDPI and ACS Style

Li, Y.-R.; Huang, C.-P.; Su, C.-C.; Chang, S.-H. Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD). Nanomaterials 2019, 9, 1332. https://doi.org/10.3390/nano9091332

AMA Style

Li Y-R, Huang C-P, Su C-C, Chang S-H. Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD). Nanomaterials. 2019; 9(9):1332. https://doi.org/10.3390/nano9091332

Chicago/Turabian Style

Li, Yan-Rui; Huang, Chin-Ping; Su, Chih-Chung; Chang, Shuo-Hung. 2019. "Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD)" Nanomaterials 9, no. 9: 1332. https://doi.org/10.3390/nano9091332

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